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Tantalum nitride

Specification or purity: 99.5% metals basis
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Tantalum nitride

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T119195-10g 10g In Stock Stock Image
T119195-50g 50g In Stock Stock Image

Basic Description

Specifications & Purity 99.5% metals basis
English Name Tantalum nitride
Synonyms Tantalum mononitride
synonyms Tantalum mononitride
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General description

antalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications.

antalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications.

Names and Identifiers

EC Number 234-788-4
IUPAC Name azanylidynetantalum
INCHI InChI=1S/N.Ta
InChi Key MZLGASXMSKOWSE-UHFFFAOYSA-N
Canonical SMILES N#[Ta]
Code Formula

TaN

PubChem CID 82832
Molecular Weight 194.95

Chemical and Physical Properties

Solubility Insoluble in water.
Melt point(°C) 3360°C

Safe Information

WGK Germany 3
Personal Protective Equipment Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter

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