氮化钽
- CAS编号: 12033-62-4
- 分子式: TaN
- 分子量: 194.95
- EC号: 234-788-4
- MDL号: MFCD00049568
- PubChem编号: 82832
规格或纯度 | 99.5% metals basis |
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英文名称 | Tantalum nitride |
别名 | 一氮化钽 |
英文别名 | Tantalum mononitride |
运输条件 | 常规运输 |
产品介绍 |
钽的氮化物,以1:1结构为主 antalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications. antalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications. |
EC号 | 234-788-4 |
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IUPAC Name | azanylidynetantalum |
INCHI | InChI=1S/N.Ta |
InChi Key | MZLGASXMSKOWSE-UHFFFAOYSA-N |
Canonical SMILES | N#[Ta] |
分子式 |
TaN |
PubChem CID | 82832 |
分子量 | 194.95 |
溶解性 | Insoluble in water. |
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熔点 | 3360°C |
WGK Germany | 3 |
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个人防护装备 | Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter |